Multi-chamber ultrasonic systems (Semiconductor)

Discover Glogar's comprehensive range of immersion wet benches, specifically designed for the diverse cleaning steps and surface treatment processes in the semiconductor industry. Our state-of-the-art ultrasonic multi-bath cleaning systems (wet benches) are available for both low and high throughput semiconductor batch production. These systems are optimally designed for cleaning full or half wafer cassettes in 6″, 8″ and 12″ sizes.

Our ultrasonic cleaning systems offer flexible application options depending on the cleaning chemistry (acidic or alkaline). They are ideal for cleaning a wide range of substrate types and sizes, including silicon wafers, glass wafers and solar cells.

Thanks to our proven and individually adaptable modular construction concept, we can offer customized solutions that are precisely tailored to our customers' requirements. From manual wet benches to semi-automatic and fully automatic wet benches - we have already implemented numerous successful customer projects. The sequence of wet-chemical processes can be individually defined to achieve optimum results.

Ultra-fine cleaning in our systems can be carried out with or without ultrasound and megasound, depending on the specific requirements. Our technology guarantees thorough and gentle cleaning that meets the highest standards.